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insulating gas clearly increased from 37.79 to 95.68% because of an increase in power from 5 to 20 W. When the power exceeded 40 W, η insulating gas exceeded 99%. When oxygen was introduced into the reactor (feed O 2 /SF 6 ratio = 2.0), η insulating gas was ~10% less than when no oxygen was added (from 28.61 to 86.09% as the power rose from 5 to 20 W). The addition of oxygenGet price

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Plasma etching of Si and SiO2 in Sulfr hexafluoride–O2 mixtures: Journal of

Jun 04, 1998 · With an SF 6 ‐O 2 mixture in the absence of silicon, the final reaction products are F 2, SOF 4, and SO 2 F 2. The product distribution was unaffected by small SiO 2 substrates. When Si is etched, SiF 4 is the only stable silicon‐containing etch product and SOF 2 is formed in oxygen‐poor mixtures. Rapid etch rates (≳10 4 Å/min for Si) can be obtained with a high selectivity in favor of silicon (Si:SiO 2 ≳40:1); thus SF 6 ‐O 2 mixtures may represent an attractive alternative toGet price

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The three parameters that determine the quality, sf6 gas concentration, humidity and quantity of decomposition products, can now be measured in one single operation with the new Sulfr hexafluoride Multi-Analyzer. As a result, service specialists can determine on site whether the gas still complies with the IEC Standard 60480 (Sulfr hexafluoride reuse) or whether it needsGet price

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Journal of Physics: Conference Series OPEN ACCESS Related

micromachining of silicon using an sf 6/O2 inductively coupled plasma F Jiang, A Keating, M Martyniuk et al.-Low-pressure nonequilibrium plasma for a top-down nanoprocess Toshiaki Makabe and Takashi Yagisawa-Recent citations Electron collision cross sections of CHF 3 and electron transport in CHF 3 and CHF 3 Ar mixtures Satoru Kawaguchi et al-Get price

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PAPER OPEN ACCESS Anisotropic plasma etching of Silicon in

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PANTHER uses Electron Capture Detection and Gas Chromatography (ECD-GC) and Mass Selective Detection and Gas Chromatography (MSD-GC) to measure numerous trace gases, including Methyl halides, HCFCs, PAN, N20, gaz sf6, CFC-12, CFC-11, Halon-1211, methyl chloroform, carbon tetrachloride.Get price

The Impact of Carrier Gas Selection on SO2 and insulating gas Melt

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